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• 000 03587cam a2200433Ii 4500

• 001 0000844306

• 003 OCoLC

• 005 20250925201200.0

• 008 121025s2013 gw a ob 001 0 eng d

• 020 __ |a 9783642273810 |q (electronic bk.)

• 020 __ |a 3642273815 |q (electronic bk.)

• 020 __ |z 9783642273803

• 020 __ |z 3642273807

• 024 7_ |a 10.1007/978-3-642-27381-0 |2 doi

• 035 __ |a (OCoLC)820818715 |z (OCoLC)819379537 |z (OCoLC)823722643 |z (OCoLC)985058817 |z (OCoLC)1005767164 |z (OCoLC)1026466999 |z (OCoLC)1067193347 |z (OCoLC)1110948741 |z (OCoLC)1112578919 |z (OCoLC)1126434781 |z (OCoLC)1136171455 |z (OCoLC)1162731183 |z (OCoLC)1204088215

• 040 __ |a E7B |b eng |e pn |e rda |c E7B |d OCLCO |d OCLCQ |d VT2 |d ORU |d GZM |d YDXCP |d I9W |d SNK |d OCLCF |d NOC |d OCLCQ |d MNM |d COO |d OCLCQ |d IDEBK |d EBLCP |d DEBSZ |d OCLCQ |d UAB |d W2U |d OCLCQ |d ESU |d IOG |d NJR |d N$T |d REB |d OCLCQ |d CEF |d OCLCA |d U3W |d WYU |d UWO |d TKN |d OCLCQ |d UKAHL |d OCLCQ |d DCT |d ERF |d OCLCQ |d SFB |d OCLCQ |d OCLCO |d OH1

• 050 _4 |a QC454.P48 |b H64 2012eb

• 072 _7 |a TA |2 lcco

• 072 _7 |a SCI |x 013010 |2 bisacsh

• 072 _7 |a PNFS |2 bicssc

• 082 04 |a 543.62 |2 23

• 090 __ |a O43/X2

• 093 __ |a O43 |2 4

• 100 1_ |a Hofmann, S. |q (Siegfried)

• 245 10 |a Auger- and x-ray photoelectron spectroscopy in materials science : |b a user-oriented guide / |c Siegfried Hofmann

• 260 __ |a Berlin ; |a Heidelberg : |b Springer, |c 2013

• 300 __ |a 1 online resource (xix, 528 pages) : |b illustrations |c 21cm

• 336 __ |a text |b txt |2 rdacontent

• 337 __ |a unmediated |b n |2 rdamedia

• 338 __ |a volume |b nc |2 rdacarrier

• 490 1_ |a Springer series in surface sciences ; |v 49

• 504 __ |a Includes bibliographical references and index

• 520 __ |a To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented

• 546 __ |a English

• 650 _0 |a X-ray photoelectron spectroscopy.

• 650 _0 |a Auger electron spectroscopy.

• 650 _0 |a Auger effect.

• 650 _2 |a Photoelectron Spectroscopy.

• 710 2_ |a Ohio Library and Information Network.