机读格式显示(MARC)

• 000 00750nam a2200253 i 4500

• 001 0000836506

• 003 _Uk

• 005 20250906161400.0

• 008 151106s2015 sz a 000 0 eng d

• 020 __ |a 9783319203843 (hbk.)

• 040 __ |a StDuBDS |b eng |c StDuBDS |e rda

• 082 04 |a 621.3815 |2 23

• 090 __ |a TN702/X1

• 093 __ |a TN702 |2 5

• 100 1_ |a Yu, Bei, |e author.

• 245 10 |a Design for manufacturability with advanced lithography / |c Bei Yu, David Z. Pan.

• 260 __ |a Cham : |b Springer, |c 2015.

• 300 __ |a xi, 164 pages : |b illustrations ; |c 24 cm

• 336 __ |a text |2 rdacontent

• 337 __ |a unmediated |2 rdamedia

• 338 __ |a volume |2 rdacarrier

• 650 _0 |a Electronic circuit design.

• 650 _0 |a Lithography.

• 700 1_ |a Pan, David Z., |e author.