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Online Public Access Catalogue

题名/责任者:

Auger- and x-ray photoelectron spectroscopy in materials science : a user-oriented guide / Siegfried Hofmann

出版发行项:

Berlin ; Heidelberg : Springer, 2013

ISBN:

9783642273810

ISBN:

3642273815

其它标准号:

10.1007/978-3-642-27381-0

载体形态项:

1 online resource (xix, 528 pages) : illustrations 21cm

丛编说明:

Springer series in surface sciences ; 49

个人责任者:

Hofmann, S. (Siegfried)

附加团体名称:

Ohio Library and Information Network.

论题主题:

X-ray photoelectron spectroscopy.

论题主题:

Auger electron spectroscopy.

论题主题:

Auger effect.

论题主题:

Photoelectron Spectroscopy.

中图法分类号:

O43

书目附注:

Includes bibliographical references and index

摘要附注:

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented

语种附注:

English

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