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题名/责任者:

Low-energy ion irradiation of materials : fundamentals and application / Bernd Rauschenbach.

出版发行项:

Cham : Springer, 2023.

ISBN:

9783030972790

载体形态项:

754 pages ; 24 cm

丛编说明:

Springer series in materials science 324 ; 324

个人责任者:

Rauschenbach, Bernd, author.

论题主题:

Industrial technology.

中图法分类号:

TB3

摘要附注:

This book provides a comprehensive introduction to all aspects of low-energy ion–solid interaction from basic principles to advanced applications in materials science. It features a balanced and insightful approach to the fundamentals of the low-energy ion–solid surface interaction, focusing on relevant topics such as interaction potentials, kinetics of binary collisions, ion range, radiation damages, and sputtering. Additionally, the book incorporates key updates reflecting the latest relevant results of modern research on topics such as topography evolution and thin-film deposition under ion bombardment, ion beam figuring and smoothing, generation of nanostructures, and ion beam-controlled glancing angle deposition. Filling a gap of almost 20 years of relevant research activity, this book offers a wealth of information and up-to-date results for graduate students, academic researchers, and industrial scientists working in these areas.

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