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题名/责任者:

Modern ion plating technology : fundamentals and applications / Fuzhen Wang, Junwei Wu.

出版发行项:

Amsterdam, Netherlands ; Cambridge, MA : Elsevier, [2023]

ISBN:

9780323908337

ISBN:

0323908330

载体形态项:

xxix, 521 pages : illustrations (black and white) ; 24 cm

个人责任者:

Wang, Fuzhen, author.

附加个人名称:

Wu, Junwei, author.

论题主题:

Ion plating.

论题主题:

Coating processes.

中图法分类号:

TG174.44

书目附注:

Includes bibliographical references and index.

内容附注:

Introduction to modern ion plating technology -- Fundamentals of vacuum physics -- Fundamentals of plasma physics -- Vacuum evaporation coating technology -- Glow discharge ion plating technology -- Arc discharge ion plating technology by hot electron emission -- Cathodic arc ion plating -- Magnetron sputtering -- Effect of charged particle flow on plating -- Plasma-enhanced chemical vapor deposition -- Plasma polymerization -- Applications in solar thin films -- Applications in information display films -- Applications in decorative films -- Applications in optical films -- Applications of hard coatings -- Applications in carbon-based film -- Applications in thermoelectric thin films -- New advances in low-temperature plasma chemical heat treatment.

摘要附注:

"Modern Ion Plating Technology: Fundamentals and Applications discusses the fundamental concepts of plasma physics in various coating technologies and explores its development and implementation into new technologies. Recent progress of technologies and products via ion plating will be introduced. The book begins with the treatment of vacuum physics, through plasma physics. It then presents the various forms of ion plating, before concluding with a section presenting examples of applications where ion plating is employed. Through the material presented in this book, the reader gains an understanding of the importance of ion plating technology to human progress and its various potential applications. Under the guidance of plasma physics knowledge, how to use electric and electromagnetic fields to control the space plasma will be critical to the development of new technology and systems" --

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